|
1
|
ONEYTY8NH7928500
|
RAW MATERIALS USE FOR SEMICONDUCTOR S RESIST
|
ATTN MR.DENNIS FEATHERSTON
|
TOYO GOSEI CO LTD
|
2019-02-13
|
Netherlands
|
4272 Kgs
|
102 PKG
|
|
2
|
ONEYTY8NL5501600
|
SEMICONDUCTOR RESIST
|
ATTN MR.DENNIS FEATHERSTON
|
TOYO GOSEI CO LTD
|
2018-08-23
|
Netherlands
|
8593 Kgs
|
110 PKG
|
|
3
|
ONEYTY8NL8598400
|
106 PACKAGES SEMICONDUCTOR S RESIST
|
ATTN MR.DENNIS FEATHERSTON
|
TOYO GOSEI CO LTD
|
2018-07-18
|
Netherlands
|
6411 Kgs
|
18 PKG
|
|
4
|
NYKSTY6NX8046500
|
PHENYLGLYCOLIC ACID MANDELIC ACID
|
ATTN MR. DENNIS FEATHERSTON
|
TOYO GOSEI CO LTD
|
2018-04-17
|
Singapore
|
2310 Kgs
|
58 PKG
|
|
5
|
NYKSTY6NX6783400
|
DIISOAMYL ETHER
|
ATTN MR. DENNIS FEATHERSTON
|
TOYO GOSEI CO LTD
|
2018-04-09
|
Netherlands
|
8099 Kgs
|
117 PKG
|
|
6
|
NYKSTY6NX2668200
|
DIISOAMYL ETHER
|
ATTN MR. DENNIS FEATHERSTON
|
TOYO GOSEI CO LTD
|
2017-05-22
|
Japan
|
9703 Kgs
|
128 PKG
|
|
7
|
NYKSTY6NX1717300
|
PHOTOGRAPHIC CHEMICALS
|
ATTN MR. DENNIS FEATHERSTON
|
TOYO GOSEI CO LTD
|
2017-03-07
|
Japan
|
8267 Kgs
|
197 PKG
|
|
8
|
NYKSTY6NX4945200
|
RAW MATERIALS USE FOR SEMICONDUCTOR S RESIST
|
ATTN MR. DENNIS FEATHERSTON
|
TOYO GOSEI CO LTD
|
2016-10-31
|
Japan
|
2828 Kgs
|
107 PKG
|
|
9
|
NYKSTY6NX4381300
|
DIISOAMYL ETHER
|
ATTN MR. DENNIS FEATHERSTON
|
TOYO GOSEI CO LTD
|
2016-10-02
|
Japan
|
9119 Kgs
|
102 PKG
|
|
10
|
NYKSTY6NX0296400
|
NONAROMATIC CARBOXYLIC ACIDS
|
ATTN MR. DENNIS FEATHERSTON
|
TOYO GOSEI CO LTD
|
2016-06-05
|
Japan
|
2434 Kgs
|
66 PKG
|